Tosoh ESL-2000 Optical Silica Glass

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Tosoh ESL-2000 Optical Silica Glass
Categories:	Ceramic; Glass
Material Notes:	ES ingots are manufactured from high-purity SiCl4 using an oxy-hydrogen flame in a verneuil type process. For very large parts, such as LCD photomasks, ES ingots are reflown into large rectangular blocks. ES ingots have a typical purity that exceeds the detection limit of 10ppb in all elements, and are virtually free of bubbles and inclusions. As a result, ES is the material of choice for LCD photomasks up to Gen. 10, and selected subgrades are widely used in leading edge stepper (KrF and ArF) and optics applications. Features: Standard optical grade for planar optics Application: : LCD Mask, Mirror & window substrate Information provided by Tosh Corporation
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Available Properties

Density
Viscosity
Hardness, Vickers
Tensile Strength
Modulus of Elasticity, Young's
Flexural Strength
Compressive Strength
Poissons Ratio
Shear Modulus
Volume Resistivity
Surface Resistance
Dielectric Constant
Dielectric Loss Index
CTE, linear
CTE, linear
Specific Heat Capacity
Thermal Conductivity
Softening Point, (?=10^7.6)*2
Annealing Point, (?=10^13)
Strain Point, (?=10^14.5)

Property Data

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