Chemraz® 640 perfluoroelastomer is specifically developed by Greene Tweed to meet the rigorous demands of aggressive plasma systems. This product’s unique formulation provides enhanced plasma resistance in oxygen and fluorine plasma processes resulting in minimal contamination, less downtime and higher wager processing yields. Chemraz 640 is recommended for both static and dynamics, wet and dry wafer processing applications such as etch, remote plasma cleans, and deposition (CVD, HDPCVD, etc.) Chemraz 640 remains stable at service temperatures up to 554°F (290°C). Applications: - Endpoint windows
- Valve seals
- Isolator valve seals
- Lid seals
- Gas inlet/outlet seals
- Slit valve seals
- Chamber seals
- Gasket seals
- Dispensing seals
- Regulator seals
- Filler seals
Information provided by Greene Tweed. |