Tosoh OP-3 Semiconductor high-purity grade, Fused Silica Glass

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Tosoh OP-3 Semiconductor high-purity grade, Fused Silica Glass
Categories:	Ceramic; Glass
Material Notes:	Tosoh OP-1 and OP-3 materials are manufactured by fusing a high-purity silica powder using Tosoh's proprietary oxy-hydrogen flame fusion process and a method of generating uniformly dispersed small bubbles inside the material. Thanks to its high purity and excellent infrared blocking properties, OP-1 has become the material of choice as a heat-insulating material for semiconductor and solar manufacturing equipment, such as epi and RTP chambers, and oxidation, diffusion, and CVD batch furnaces. OP-3 is an enhanced version of OP-1 material, with further reduced alkali content for use in processes that require extreme contamination control. OP-3HD is a high-density version of OP-3, with a smaller diameter bubble size distribution that provides enhanced sealing properties and lifetime for advanced batch furnace processes. Available in up to 1,000mm round and square ingots, OP-1, OP-3, and OP-3HD materials are 450mm wafer ready. Information provided by Tosh Corporation
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Available Properties
Density Viscosity Hardness, Vickers Flexural Strength Dielectric Constant Dielectric Strength Dielectric Loss Index CTE, linear Specific Heat Capacity Thermal Conductivity Softening Point, (?=107.6)*2 Annealing Point, (?=1013) Strain Point, (?=1014.5)

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