| High purity alumina ceramic of 99.5% Al2O3 content. Its purity, chemical resistance and high temperature capabilities prove invaluable for semiconductor processing applications. Prime Features: - Electrically and dimensionally stable at high temperatures
- Low particle generation
- Dense, non-porous and vacuum tight
- Excellent dielectric properties
- Accepts moly-manganese metallizing for high temperature brazing of vacuum tight assemblies
- Excellent chemical and abrasion resistance
Typical applications: - Wafer processing and handling devices
- Components for semiconductor process ambers, spluttering targets, fixtures, etc. Laser devices for wide range of industrial, medical and defence duties
- Power tubes for klystron and x-ray equipment
- Flow meters and pressure sensors
Production Capabilities: - Isostatic and dry pressing, green machining
- CNC grinding and lapping to very tight tolerances
- Metallising of components
- High temperature brazing of assemblies
- Prototype, batch and volume production
Information provided by Morgan Advanced Materials |
