We specialize in producing high purity Magnesium Nickel Cobalt Alloy Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in hydrogen storage, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard sputtering targets for thin film deposition are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations Molecular Formula: Mg/Ni/Co Synonyms: Mg2Ni0.75Co0.25,Mg:Ni:Co(52/45/3wt%) Alfa Chemistry Materials product group: Alloys Manufacturer data sheet |