Exceptional modulus and compressive strength. The Chemical Vapor Deposition process uses fine tungsten wire for the substrate and boron trichloride gas as the boron source. Elemental boron is deposited on a fine tungsten wire substrate and produced in diameters of 4.0-mil (102-micron) and 5.6-mil (142-micron). The resulting fiber is essentially amorphous boron with a fully borided-tungsten core. The textured surface provides an excellent interface in resin matrix composites, eliminating any need for sizing treatments. Primarily used in resin-matrix compositesInformation provided by Specialty Materials, Inc. |