These small, precision cast indium units are the product of an innovative processing technology based on vacuum induction melting. These ingots are ready-to-use for the epitaxial layer preparation of III-V compounds (used in semiconductors for high-speed electronic and optoelectronic applications). Ingots are offered in a range of metal purities, from 6N (99.9999%) towards 7N metal. The ingots are non-porous and are predominantly single crystal. |