CAS No. 110-43-0 Product Description: Eastman EastaPure™ MAK (Methyl n-Amyl Ketone) is being offered for positive and negative photoresist formulations. It has a minimum assay of 99.0%. It is a high-purity low-trace metal solvent and is tested to measure selected critical trace metals in parts-per-billion levels. EastaPure™ MAK can also be used in edge bead removal process after spin coating. The chemical substances for this product are listed as Inert Ingredients Permitted for Use in Nonfood Use Pesticide Products, and in Food Use Pesticide Products with limitations, under the Federal Insecticide, Fungicide, and Rodenticide Act (FIFRA). Application/Uses: - Advanced resist
- Developers
- Edge bead removal
- LED/OLED
- Microelectronics
- Negative tone resist
- Photolithography
- Photoresist
- Photoresist stripper applications
- Positive tone resist
- Semiconductors
Key Attributes:- Excellent resin solubility
- High assay
- High Purity/Low Trace Metals
- Inert - Food use with limitations
- Inert - Nonfood use
Information provided by Eastman |